1·A method of simulating and optimizing lithographic process parameters is proposed based on the concept of effective time difference.
通过引入有效时差的概念，提出了一种可模拟光刻工艺参数间的相互关系及优化光刻参数的方法。
2·The actual lithographic process was simulated according to the process conditions, such as lithographic tools and the property of resist.
根据光刻机和光刻胶特性，模拟了实际的光刻过程。
3·Lithography is the key technology in integrated circuit technology, the idea originated in printing technology in the photo lithographic process.
光刻是集成电路工艺中的关键性技术，其构想源自于印刷技术中的照相制版技术。
4·The invention provides a composition for under-resist film formation which is for use in a lithographic process for producing a semiconductor device.
本发明的课题是提供在半导体装置制造的光刻工艺中使用的形成抗蚀剂下层膜的组合物。
5·On small quantity runs, it is generally less expensive to use the lithographic printing process due to the make ready charges that would be charged for a special order printed with flexography.
在小批量运行时，它一般不使用昂贵的平版印刷过程中由于使该会与柔印印刷准备了特别命令收取费用。
6·Abstract: Lithographic exposure is the key process in the manufacture of integrated circuit, and the performance of exposure system decides the level of microelectronic manufacture technology.
摘要：投影曝光工艺是集成电路制造过程中的关键环节，曝光系统的工艺水平已成为衡量微电子制造技术的重要标志。
7·Lithographic exposure is the key process in the manufacture of integrated circuit, and the performance of exposure system decides the level of microelectronic manufacture technology.
投影曝光工艺是集成电路制造过程中的关键环节，曝光系统的工艺水平已成为衡量微电子制造技术的重要标志。
8·General lithographic, gravure, flexo printing, and varnish process after printing.
一般平版，凹版，凸版印刷及印后上光油加工。
9·Fabrication process of polymer microlens arrays is introduced based on soft lithographic UV-molding replication method.
介绍了利用软刻蚀紫外模塑技术制作复制聚合物折射和衍射微透镜阵列的工艺过程。
10·The lithographic and etching process for a membrane creates a mesh of metal wires with silicon dioxide filling the space between them.
薄膜先以微影及蚀刻制程制作出金属线路，线路之间则填入二氧化矽。